US Patent 10191393 Lithographic apparatus, and device manufacturing method
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Patent abstract
A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.
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Patent Inventor Names
Frank Pieter Albert Van Den Berkmortel0
Fransiscus Mathijs Jacobs0
Jan Steven Christiaan Westerlaken0
Jeroen Arnoldus Leonardus Johannes Raaymakers0
Marc Wilhelmus Maria Van Der Wijst0
Marcel Koenraad Marie Baggen0
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US Patent 10191393 Lithographic apparatus, and device manufacturing method
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Is a
Patent jurisdiction
Patent number
10191393
Date of patent
January 29, 2019
Patent application number
15558552
Date Filed
February 22, 2016
Patent primary examiner
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