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US Patent 10204782 Combined anneal and selective deposition process
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Patent
Date Filed
April 18, 2016
Date of Patent
February 12, 2019
Patent Application Number
15132091
Patent Citations Received
US Patent 12092953 Patterning of nanostructures using imprint lithography
0
US Patent 11501966 Selective layer formation using deposition and removing
US Patent 11830732 Selective passivation and selective deposition
0
US Patent 11446699 Vapor phase deposition of organic films
US Patent 11501965 Plasma enhanced deposition processes for controlled formation of metal oxide thin films
US Patent 10453701 Deposition of organic films
US Patent 11525184 Dual selective deposition
US Patent 10551741 Method of forming a directed self-assembled layer on a substrate
US Patent 10695794 Vapor phase deposition of organic films
US Patent 10741394 Combined anneal and selective deposition process
•••
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10204782
Patent Primary Examiner
Caridad Everhart
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