Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 13, 2022
Patent Application Number
17331971
Date Filed
May 27, 2021
Patent Citations
...
Patent Primary Examiner
Methods are provided for dual selective deposition of a first material on a first surface of a substrate and a second material on a second, different surface of the same substrate. The selectively deposited materials may be, for example, metal, metal oxide, or dielectric materials.
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