Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 9, 2019
Patent Application Number
15070594
Date Filed
March 15, 2016
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve. Deposition reactors conducive to depositing organic films are provided.
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