Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Moon-Han Park0
Dong-Hoon Khang0
Dong-Woo Kang0
Ji-Ho Yoo0
Chong-Kwang Chang0
Date of Patent
March 5, 2019
0Patent Application Number
158913910
Date Filed
February 8, 2018
0Patent Citations Received
Patent Primary Examiner
Patent abstract
An integrated circuit device is manufactured by a method including forming a stacked mask structure including a carbon-containing film and a silicon-containing organic anti-reflective film is on a substrate, forming a silicon-containing organic anti-reflective pattern by etching the silicon-containing organic anti-reflective film, and forming a composite mask pattern including a carbon-containing mask pattern and a profile control liner lining interior surfaces of the carbon-containing mask pattern by etching the carbon-containing film while using the silicon-containing organic anti-reflective pattern as an etch mask. Ions are implanted into the substrate through a plurality of spaces defined by the composite mask pattern.
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