Patent attributes
The present technology relates to a solid state imaging device that enables a reduction in the manufacturing cost of the solid state imaging device, and an electronic apparatus. A first substrate including a pixel circuit having a pixel array unit and a second substrate including a first and a second signal processing circuit arranged side by side across a scribe area are stacked. The second substrate includes a first moisture-resistant ring surrounding at least part of a periphery of the first signal processing circuit, a second moisture-resistant ring surrounding at least part of a periphery of the second signal processing circuit, a third moisture-resistant ring surrounding at least part of a periphery of the second substrate in a layer different from the first and second moisture-resistant rings, and a barrier unit separating a first area between the first and second moisture-resistant rings and a second area. The present technology can be applied to, for example, a solid state imaging device such as a CMOS image sensor.
