US Patent 10269868 Semiconductor structure and the method of making the same

The present invention provides a semiconductor structure, the semiconductor structure includes a fin transistor (fin filed effect transistor, finFET) located on a substrate, the fin transistor includes a gate structure crossing over a fin structure, and at least one source/drain region. And a resistive random access memory (RRAM) includes a lower electrode, a resistance switching layer and a top electrode being sequentially located on the source/drain region and electrically connected to the fin transistor.