Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Bo-Feng Young0
Che-Cheng Chang0
Po-Chi Wu0
Date of Patent
April 23, 2019
0Patent Application Number
156387380
Date Filed
June 30, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A manufacturing process and device are provided in which a first opening in formed within a substrate. The first opening is reshaped into a second opening using a second etching process. The second etching process is performed with a radical etch in which neutral ions are utilized. As such, substrate push is reduced.
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