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US Patent 10304659 Ale smoothness: in and outside semiconductor industry

Patent 10304659 was granted and assigned to Lam Research on May, 2019 by the United States Patent and Trademark Office.

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Is a

Patent attributes

Patent Applicant

Current Assignee

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Inventor Names

Thorsten Lill0

Richard Wise0

Samantha Tan0

Yang Pan0

Jeffrey Marks0

Keren Jacobs Kanarik0

Meihua Shen0

Date of Patent

May 28, 2019

Patent Application Number

15952834

Date Filed

April 13, 2018

Patent Citations

US Patent 10056268 Limiting electronic package warpage

0

US Patent 10096487 Atomic layer etching of tungsten and other metals

Patent Citations Received

US Patent 11450513 Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials

0

US Patent 10685836 Etching substrates using ALE and selective deposition

0

US Patent 10727073 Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces

0

US Patent 11658043 Selective anisotropic metal etch

0

Patent Primary Examiner

Patent abstract

Methods of etching and smoothening films by exposing to a halogen-containing plasma and an inert plasma within a bias window in cycles are provided. Methods are suitable for etching and smoothening films of various materials in the semiconductor industry and are also applicable to applications in optics and other industries.

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