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US Patent 10304659 Ale smoothness: in and outside semiconductor industry

Patent 10304659 was granted and assigned to Lam Research on May, 2019 by the United States Patent and Trademark Office.

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Patent abstract

Methods of etching and smoothening films by exposing to a halogen-containing plasma and an inert plasma within a bias window in cycles are provided. Methods are suitable for etching and smoothening films of various materials in the semiconductor industry and are also applicable to applications in optics and other industries.

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Patent Inventor Names

Jeffrey Marks0

Keren Jacobs Kanarik0

Meihua Shen0

Richard Wise0

Samantha Tan0

Thorsten Lill0

Yang Pan0

Edits on 29 Jul, 2023

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edited on 29 Jul, 2023

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Patent Citations Received

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US Patent 11450513 Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials

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edited on 24 May, 2023

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Patent Citations Received

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US Patent 11658043 Selective anisotropic metal etch

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=10304659

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edited on 4 Apr, 2023

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Patent Citations Received

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US Patent 10727073 Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces

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edited on 1 Apr, 2023

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Patent Citations Received

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US Patent 11450513 Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials

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edited on 29 Mar, 2023

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Patent Citations

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US Patent 10056268 Limiting electronic package warpage

Edits on 27 Sep, 2022

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edited on 27 Sep, 2022

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Patent Citations Received

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US Patent 10685836 Etching substrates using ALE and selective deposition

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Patent Citations Received

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US Patent 11450513 Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials

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edited on 18 Jun, 2022

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Website URL

https://pdfpiw.uspto.gov/.piw?Docid=10304659

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edited on 5 Feb, 2022

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Patent citations received

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US Patent 10727073 Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces

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edited on 4 Feb, 2022

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Infobox (+1 properties)

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Patent citations received

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US Patent 10685836 Etching substrates using ALE and selective deposition

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