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US Patent 10312048 Creating ion energy distribution functions (IEDF)

Patent 10312048 was granted and assigned to Applied Materials on June, 2019 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
Applied Materials
Applied Materials
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Date Filed
December 7, 2017
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Date of Patent
June 4, 2019
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Patent Applicant
Applied Materials
Applied Materials
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Patent Application Number
15834939
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Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 11462389 Pulsed-voltage hardware assembly for use in a plasma processing system
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US Patent 11476090 Voltage pulse time-domain multiplexing
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US Patent 11476145 Automatic ESC bias compensation when using pulsed DC bias
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US Patent 11495470 Method of enhancing etching selectivity using a pulsed plasma
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US Patent 11508554 High voltage filter assembly
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US Patent 11069504 Creating ion energy distribution functions (IEDF)
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US Patent 11651966 Methods and apparatus for processing a substrate
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US Patent 11284500 Method of controlling ion energy distribution using a pulse generator
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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•••
Patent Inventor Names
Travis Koh
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Olivier Luere
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Philip A. Kraus
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Rajinder Dhindsa
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James Hugh Rogers
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Leonid Dorf
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Olivier Joubert
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10312048
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Patent Primary Examiner
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David A. Vanore
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