Patent attributes
A method and apparatus for forming a semiconductor structure is provided. The semiconductor structure comprises a stacked fin structure formed on a surface of a first insulator layer. The stacked fin structure comprises a first doped semiconductor fin portion and a second doped semiconductor fin portion. The anti-fuse structure further comprises a first highly doped diamond shaped epitaxial structure grown about the first semiconductor fin portion and a second diamond shaped highly doped epitaxial structure grown about the second semiconductor fin portion. The first highly doped epitaxial structure has a lower-most apex overlying and aligned with an upper-most apex of the second highly doped epitaxial structure. The lower-most apex is separated from the upper-most apex by a gap. A second insulating layer formed about the first highly-doped epitaxial structure and the second highly-doped epitaxial structure, wherein the second insulator layer fills the gap.
