Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Emily Gallagher0
Cedric Huyghebaert0
Rik Jonckheere0
Date of Patent
July 16, 2019
0Patent Application Number
159798130
Date Filed
May 15, 2018
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The present disclosure provides a lithographic reticle system comprising a reticle, a first pellicle membrane mounted in front of the reticle, and a second pellicle membrane mounted in front of the first pellicle membrane, wherein the first pellicle membrane is arranged between the reticle and the second pellicle membrane, and wherein the second pellicle membrane is releasably mounted in relation to the first pellicle membrane and the reticle.
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