Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Marcio D. Lima0
Takahiro Ueda0
Date of Patent
September 10, 2024
0Patent Application Number
182310000
Date Filed
August 7, 2023
0Patent Citations
Patent Primary Examiner
CPC Code
Patent abstract
A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a planar orientation. The interconnected structure allows for a high minimum EUV transmission rate of at least 92%, with a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.
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