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US Patent 12085844 Ultra-thin, ultra-low density films for EUV lithography
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Patent
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Date Filed
August 7, 2023
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Date of Patent
September 10, 2024
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Patent Application Number
18231000
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Patent Citations
US Patent 10712659 Method for forming a carbon nanotube pellicle membrane
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US Patent 7767985 EUV pellicle and method for fabricating semiconductor dies using same
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US Patent 10353284 Lithographic reticle system
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Patent Inventor Names
Marcio D. Lima
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Takahiro Ueda
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
12085844
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Patent Primary Examiner
Christopher G Young
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CPC Code
G03F 1/64
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G03F 7/70983
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G03F 1/22
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