Patent attributes
A method includes providing a structure having a substrate, a fin, and a gate structure; performing an implantation process to implant a dopant into the fin adjacent to the gate structure; and forming gate sidewall spacers and fin sidewall spacers. The method further includes performing a first etching process to recess the fin adjacent to the gate sidewall spacers while keeping at least a portion of the fin above the fin sidewall spacers. The method further includes performing another implantation process to implant the dopant into the fin and the fin sidewall spacers; and performing a second etching process to recess the fin adjacent to the gate sidewall spacers until a top surface of the fin is below a top surface of the fin sidewall spacers, resulting in a trench between the fin sidewall spacers. The method further includes epitaxially growing a semiconductor material in the trench.
