US Patent 10438797 Method of quasi atomic layer etching
Patent 10438797 was granted and assigned to Tokyo Electron on October, 2019 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
September 6, 2017
Date of Patent
October 8, 2019
Patent Application Number
15697168
Patent Citations Received
•••
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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