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US Patent 10439049 Nanosheet device with close source drain proximity
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Patent
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Date Filed
December 19, 2017
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Date of Patent
October 8, 2019
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Patent Application Number
15847894
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Patent Citations Received
US Patent 11368016 ESD protection for integrated circuit devices
US Patent 10840360 Nanosheet device with close source drain proximity
US Patent 10957799 Transistor channel having vertically stacked nanosheets coupled by fin-shaped bridge regions
US Patent 10985279 Source and drain epitaxy and isolation for gate structures
US Patent 11664656 ESD protection for integrated circuit devices
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US Patent 11495688 Source and drain epitaxy and isolation for gate structures
Patent Inventor Names
Shogo Mochizuki
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Veeraraghavan S. Basker
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Alexander Reznicek
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10439049
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Patent Primary Examiner
Didarul A Mazumder
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