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US Patent 10444161 Systems and methods for metrology with layer-specific illumination spectra

Patent 10444161 was granted and assigned to KLA-Tencor on October, 2019 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent

Patent attributes

Patent Applicant
KLA-Tencor
KLA-Tencor
Current Assignee
KLA-Tencor
KLA-Tencor
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10444161
Date of Patent
October 15, 2019
Patent Application Number
15608766
Date Filed
May 30, 2017
Patent Citations Received
‌
US Patent 12111580 Optical metrology utilizing short-wave infrared wavelengths
0
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US Patent 11852590 Systems and methods for metrology with layer-specific illumination spectra
0
Patent Primary Examiner
‌
Violeta A Prieto
Patent abstract

A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.

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