Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 29, 2019
Patent Application Number
14840581
Date Filed
August 31, 2015
Patent Citations Received
Patent Primary Examiner
Patent abstract
A lithography system includes a load lock chamber comprising an opening configured to receive a mask, an exposure module configured to expose a semiconductor wafer to a light source through use of the mask, and a cleaning module embedded inside the lithography tool, the cleaning module being configured to clean carbon particles from the mask.
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