Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chun-Fu Yang0
Hsin-Chang Lee0
Pei-Cheng Hsu0
Ta-Cheng Lien0
Date of Patent
June 14, 2022
0Patent Application Number
165680280
Date Filed
September 11, 2019
0Patent Citations
Patent Primary Examiner
CPC Code
A method includes placing a photomask having a contamination on a surface thereof in a plasma processing chamber. The contaminated photomask is plasma processed in the plasma processing chamber to remove the contamination from the surface. The plasma includes oxygen plasma or hydrogen plasma.
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