US Patent 10495983 Piecewise alignment modeling method
Patent 10495983 was granted and assigned to Applied Materials on December, 2019 by the United States Patent and Trademark Office.
All edits
Edits on 9 Dec, 2023
Golden AI
Edits made to:
Article (+586 characters)
Article
Patent abstract
Methods are provided and generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.
Edits on 5 Oct, 2023
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 3 Oct, 2023
Golden AI
Edits made to:
Infobox (+2 properties)
Infobox
Patent Inventor Names
Hwan J. Jeong0
Tamer Coskun0
Edits on 28 Apr, 2023
Golden AI
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
104959830
Date of Patent
December 3, 2019
0Patent Application Number
161469510
Date Filed
September 28, 2018
0Patent Citations
Patent Primary Examiner
Edits on 30 Jan, 2022
Golden AI
Edits made to:
Infobox (+10 properties)
US Patent 10495983 Piecewise alignment modeling method
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
10495983
Date of patent
December 3, 2019
Patent application number
16146951
Date Filed
September 28, 2018
Patent citations
Patent primary examiner
Find more entities like US Patent 10495983 Piecewise alignment modeling method
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
