Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
December 17, 2019
Patent Application Number
15689187
Date Filed
August 29, 2017
Patent Citations Received
Patent Primary Examiner
Patent abstract
An atomic layer deposition-inhibiting material composed of a fluorine-containing resin that has a fluorine content of 30 at % or greater, has at least one tertiary carbon atom and quaternary carbon atom, and lacks ester groups, hydroxyl groups, carboxyl groups, and imide groups.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
