Patent 10508337 was granted and assigned to Murata Manufacturing on December, 2019 by the United States Patent and Trademark Office.
An atomic layer deposition-inhibiting material composed of a fluorine-containing resin that has a fluorine content of 30 at % or greater, has at least one tertiary carbon atom and quaternary carbon atom, and lacks ester groups, hydroxyl groups, carboxyl groups, and imide groups.