US Patent 10516064 Multiple width nanosheet devices

A technique relates to a semiconductor device. A first stack includes a first plurality of nanowires respectively coupled to first source and drain regions, and a second stack includes a second plurality of nanowires respectively coupled to second source and drain regions. First source and drain contacts couple to a first predefined number of the first plurality of nanowires. Second source and drain contacts to couple to a second predefined number of the second plurality of nanowires, wherein the first predefined number is different from the second predefined number.