Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 21, 2020
Patent Application Number
13907789
Date Filed
May 31, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
