Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dong-Yong Kim0
Min-Kyung Jang0
Chang-Young Hong0
Eui-Hyun Ryu0
Date of Patent
February 18, 2020
Patent Application Number
15281492
Date Filed
September 30, 2016
Patent Citations Received
Patent Primary Examiner
Patent abstract
New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition.
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