Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama0
Date of Patent
November 15, 2022
0Patent Application Number
167088510
Date Filed
December 10, 2019
0Patent Citations
Patent Primary Examiner
CPC Code
A positive resist composition comprising a base polymer comprising recurring units having a nitrogen-containing tertiary ester structure exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
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