US Patent 10586695 Substrate processing method and substrate processing device
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Patent abstract
Method for performing cleaning treatment on a substrate having a fine pattern provided with a film formed on the surface, comprises: a silylating step of supplying a silylating agent to the surface of the substrate and silylating the surface of the substrate; and a liquid-chemical cleaning step of supplying a cleaning liquid chemical to the surface of the substrate and cleaning the surface of the substrate after, or simultaneously with, the silylating step.
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Is a
Patent Applicant
Patent Jurisdiction
Patent Number
105866950
Date of Patent
March 10, 2020
0Patent Application Number
155481830
Date Filed
December 28, 2015
0Patent Citations Received
Patent Primary Examiner
Edits on 25 Sep, 2022
Golden AI
Infobox
Is a
Patent Applicant
Patent Jurisdiction
Patent Number
105866950
Date of Patent
March 10, 2020
0Patent Application Number
155481830
Date Filed
December 28, 2015
0Patent Citations Received
Patent Primary Examiner
Edits on 12 Feb, 2022
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US Patent 10586695 Substrate processing method and substrate processing device
Infobox
Is a
Patent applicant
Patent jurisdiction
Patent number
10586695
Date of patent
March 10, 2020
Patent application number
15548183
Date Filed
December 28, 2015
Patent primary examiner
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