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US Patent 10643840 Selective deposition defects removal by chemical etch

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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1064384000
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Patent Citations Received
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US Patent 11628467 Selective coating of a structure
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https://pdfpiw.uspto.gov/.piw?Docid=10643840
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 US Patent 10643840 Selective deposition defects removal by chemical etch

Infobox
Is a
Patent
Patent
Patent applicant
Applied Materials
Applied Materials
Current assignee
Applied Materials
Applied Materials
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10643840
Date of patent
May 5, 2020
Patent application number
16129223
Date Filed
September 12, 2018
Patent citations
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US Patent 10192752 Self-assembled monolayer blocking with intermittent air-water exposure
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US Patent 10366878 Selective deposition through formation of self-assembled monolayers
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US Patent 10428421 Selective deposition on metal or metallic surfaces relative to dielectric surfaces
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US Patent 10480064 Reaction chamber passivation and selective deposition of metallic films
Patent primary examiner
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David E. Graybill

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