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US Patent 10675581 Gas abatement apparatus

Patent 10675581 was granted and assigned to Applied Materials on June, 2020 by the United States Patent and Trademark Office.

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Is a

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Date of Patent

June 9, 2020

Patent Application Number

16055929

Date Filed

August 6, 2018

Patent Citations

US Patent 10083834 Methods of forming self-aligned vias

Patent Citations Received

US Patent 11881411 High pressure annealing process for metal containing materials

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US Patent 11469113 High pressure and high temperature anneal chamber

US Patent 11527421 Gas delivery system for high pressure processing chamber

US Patent 11756803 Gas delivery system for high pressure processing chamber

US Patent 11361978 Gas delivery module

US Patent 11462417 High pressure and high temperature anneal chamber

US Patent 11581183 Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom

US Patent 11018032 High pressure and high temperature anneal chamber

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Patent Primary Examiner

Marina A Tietjen

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