US Patent 10707090 Plasma etching method
Patent 10707090 was granted and assigned to Tokyo Electron on July, 2020 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
April 10, 2018
Date of Patent
July 7, 2020
Patent Applicant
Patent Application Number
15949185
Patent Citations Received
•••
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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