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US Patent 10777411 Semiconductor device with selective dielectric deposition
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Patent
Date Filed
May 31, 2019
Date of Patent
September 15, 2020
Patent Application Number
16427779
Patent Citations
US Patent 10047435 Dual selective deposition
US Patent 10192752 Self-assembled monolayer blocking with intermittent air-water exposure
Patent Citations Received
US Patent 12094766 Selective blocking of metal surfaces using bifunctional self-assembled monolayers
0
US Patent 11610841 Interconnect structure for semiconductor device and methods of fabrication thereof
US Patent 11967523 Self-assembled monolayer for selective deposition
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10777411
Patent Primary Examiner
Peniel M Gumedzoe
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