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US Patent 10847360 High pressure treatment of silicon nitride film

Patent 10847360 was granted and assigned to Applied Materials on November, 2020 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

10847360

Date of Patent

November 24, 2020

Patent Application Number

15605751

Date Filed

May 25, 2017

Patent Citations

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US Patent 10083834 Methods of forming self-aligned vias

Patent Citations Received

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US Patent 11881411 High pressure annealing process for metal containing materials

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US Patent 11469113 High pressure and high temperature anneal chamber

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US Patent 11527421 Gas delivery system for high pressure processing chamber

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US Patent 11756803 Gas delivery system for high pressure processing chamber

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US Patent 11361978 Gas delivery module

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US Patent 11462417 High pressure and high temperature anneal chamber

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US Patent 11581183 Methods of forming amorphous carbon hard mask layers and hard mask layers formed therefrom

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US Patent 11610773 Condenser system for high pressure processing system

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Patent Primary Examiner

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Elizabeth A Burkhart

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