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US Patent 10854423 Multi-beam particle beam system

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
February 15, 2019
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Date of Patent
December 1, 2020
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Patent Application Number
16277572
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Patent Citations
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US Patent 10176965 Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets
Patent Citations Received
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US Patent 12119204 Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams
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US Patent 11562881 Charged particle beam system
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US Patent 11562880 Particle beam system for adjusting the current of individual particle beams
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US Patent 12094683 Method for operating a multi-beam particle beam microscope
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US Patent 11521827 Method of imaging a 2D sample with a multi-beam particle microscope
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US Patent 11645740 Method for detector equalization during the imaging of objects with a multi-beam particle microscope
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US Patent 11657999 Particle beam system and method for the particle-optical examination of an object
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US Patent 11935721 System comprising a multi-beam particle microscope and method for operating the same
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10854423
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Patent Primary Examiner
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David E Smith
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