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US Patent 10866197 Dispositioning defects detected on extreme ultraviolet photomasks

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Patent Citations Received
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US Patent 11675275 Positioning method and apparatus for particles on reticle, storage medium, and electronic device
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1086619700
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https://pdfpiw.uspto.gov/.piw?Docid=10866197
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 US Patent 10866197 Dispositioning defects detected on extreme ultraviolet photomasks

Infobox
Is a
Patent
Patent
Patent applicant
Current assignee
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10866197
Date of patent
December 15, 2020
Patent application number
16563763
Date Filed
September 6, 2019
Patent citations
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US Patent 10241390 Reflective mask blank and process for producing the reflective mask blank
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US Patent 10401299 Image capturing apparatus and inspection apparatus and inspection method
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US Patent 10451563 Inspection of photomasks by comparing two photomasks
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US Patent 10634623 Phase contrast monitoring for extreme ultra-violet (EUV) masks defect inspection
Patent primary examiner
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Naum Levin

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