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US Patent 10867108 Optical mode optimization for wafer inspection
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Patent
Date Filed
January 17, 2019
Date of Patent
December 15, 2020
Patent Application Number
16250128
Patent Citations
US Patent 10599951 Training a neural network for defect detection in low resolution images
US Patent 10338002 Methods and systems for selecting recipe for defect inspection
US Patent 10713534 Training a learning based defect classifier
US Patent 10115040 Convolutional neural network-based mode selection and defect classification for image fusion
US Patent 10267748 Optimizing training sets used for setting up inspection-related algorithms
Patent Citations Received
US Patent 11368158 Methods for handling integrated circuit dies with defects
US Patent 11748551 Optical mode optimization for wafer inspection
US Patent 11347926 Optical mode optimization for wafer inspection
US Patent 11788972 Method of automatically setting optical parameters and automated optical inspection system using the same
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10867108
Patent Primary Examiner
Leigh M. Garbowski
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