Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 26, 2021
Patent Application Number
16605542
Date Filed
April 20, 2018
Patent Citations Received
Patent Primary Examiner
Patent abstract
A method, including: obtaining a set of conditions for a resist development model for simulating a resist development process of a resist layer; and performing, by a hardware computer system, a computer simulation of the resist development process using the set of conditions and the resist development model to obtain a characteristic of the development of the resist layer, wherein the computer simulation separately simulates different certain different physical and chemical processes and characteristics of the resist development process.
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