Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 25, 2023
0Patent Application Number
174163140
Date Filed
December 13, 2019
0Patent Citations
Patent Primary Examiner
A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.
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