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US Patent 10908513 Metrology method and apparatus and computer program
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Patent
Date Filed
July 3, 2018
Date of Patent
February 2, 2021
Patent Application Number
16026507
Patent Citations
US Patent 10437163 Method and apparatus for design of a metrology target
US Patent 10527958 Lithographic method
Patent Citations Received
US Patent 12130562 Method of obtaining array of plurality of regions on substrate, exposure apparatus, method of manufacturing article, non-transitory storage medium, and information processing apparatus
0
US Patent 11353796 Method and apparatus for determining a radiation beam intensity profile
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10908513
Patent Primary Examiner
Gordon J Stock, Jr.
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