Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
February 16, 2021
Patent Application Number
16790086
Date Filed
February 13, 2020
Patent Citations
...
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.
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