Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
February 16, 2021
Patent Application Number
16436022
Date Filed
June 10, 2019
Patent Primary Examiner
Patent abstract
A method for the dry removal of a material on a microelectronic workpiece is described. The method includes receiving a substrate having a working surface exposing a silicon-germanium alloy and at least one other material, the silicon-germanium alloy represented as SixGe1-x, wherein x is a real number ranging from 0 to 1; and selectively etching the silicon-germanium alloy relative to the other material by exposing the substrate to a controlled gas-phase environment containing an anhydrous halogen compound, such as a diatomic halogen or an interhalogen compound.
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