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US Patent 11030381 Leakage analysis on semiconductor device
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Patent
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Date Filed
September 27, 2019
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Date of Patent
June 8, 2021
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Patent Application Number
16586658
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Patent Citations
US Patent 10832958 Leakage reduction methods and structures thereof
US Patent 10867115 System and method for calculating cell edge leakage
US Patent 10276445 Leakage reduction methods and structures thereof
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US Patent 10467374 System and method for calculating cell edge leakage
Patent Citations Received
US Patent 11714949 Leakage analysis on semiconductor device
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Patent Inventor Names
Yun-Xiang Lin
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Cheng-Hua Liu
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Chung-Hsing Wang
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Yuan-Te Hou
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11030381
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Patent Primary Examiner
Helen Rossoshek
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