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US Patent 11048179 Apparatus for removing residues from source vessel

Patent 11048179 was granted and assigned to Samsung on June, 2021 by the United States Patent and Trademark Office.

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edited on 12 Dec, 2023
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Patent abstract

An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200° C. to 800° C.

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Patent Citations Received
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US Patent 11822260 Apparatus for removing residue of EUV light source vessel
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Patent Inventor Names
Ho Yu0
Inho Choi0
Jeonggil Kim0
Jinhwan Lee0
Jongbin Park0
Minseok Choi0
Edits on 24 May, 2023
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=110481790
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Edits on 23 Sep, 2022
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edited on 23 Sep, 2022
Infobox
Is a
Patent
Patent
0
Patent Applicant
Samsung
Samsung
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Current Assignee
Samsung
Samsung
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
110481790
Date of Patent
June 29, 2021
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Patent Application Number
167333250
Date Filed
January 3, 2020
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=110481790
Patent Citations
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US Patent 10362664 System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
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Patent Primary Examiner
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Deoram Persaud
0
Edits on 6 Jun, 2022
"Entity importer update"
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edited on 6 Jun, 2022
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=11048179
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 US Patent 11048179 Apparatus for removing residues from source vessel

Infobox
Is a
Patent
Patent
Patent applicant
Samsung
Samsung
Current assignee
Samsung
Samsung
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
11048179
Date of patent
June 29, 2021
Patent application number
16733325
Date Filed
January 3, 2020
Patent citations
‌
US Patent 10362664 System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
Patent primary examiner
‌
Deoram Persaud

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