Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Lin-Yu Huang0
Jia-Chuan You0
Yu-Ming Lin0
Tien-Lu Lin0
Chia-Hao Chang0
Chih-Hao Wang0
Date of Patent
July 20, 2021
Patent Application Number
16548423
Date Filed
August 22, 2019
Patent Primary Examiner
Patent abstract
A method for forming a semiconductor device structure is provided. The method for forming the semiconductor device structure includes forming a first mask layer covering the gate stack, forming a contact alongside the gate stack and the first mask layer, recessing the contact, etching the first mask layer, and forming a second mask layer covering the contact and a portion of the first mask layer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.