Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Guo-Huei Wu0
Hui-Zhong Zhuang0
Jiann-Tyng Tzeng0
Shih-Wei Peng0
Wei-Cheng Lin0
Date of Patent
September 21, 2021
0Patent Application Number
202003310
Date Filed
March 31, 2020
0Patent abstract
An IC device includes a gate structure including an isolation layer laterally adjacent to a gate electrode, a transistor including a first S/D structure, a second S/D structure, and a channel extending through the gate electrode, a third S/D structure overlying the first S/D structure, a fourth S/D structure overlying the second S/D structure, and a conductive structure overlying the isolation layer and configured to electrically connect the third S/D structure to the fourth S/D structure.
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