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US Patent 12079559 IC device layout method

Patent 12079559 was granted and assigned to Taiwan Semiconductor Manufacturing Company on September, 2024 by the United States Patent and Trademark Office.

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Patent abstract

A method of generating an IC layout diagram includes overlapping a channel region of an upper transistor of a complementary field-effect transistor (CFET) in an IC layout with a gate region of the CFET, thereby defining a channel overlap region, positioning an isolation region in the IC layout, the isolation region including an entirety of the channel overlap region, intersecting the isolation region with a conductive region, and generating an IC layout diagram based on the IC layout.

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