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US Patent 7260442 Method and system for mask fabrication process control

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Is a
Patent
Patent
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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
72604420
Date of Patent
August 21, 2007
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Patent Application Number
107922460
Date Filed
March 3, 2004
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Patent Citations Received
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US Patent 12135930 Integrated circuit layout generation method and system
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US Patent 12125840 Non-transitory computer-readable medium, integrated circuit device and method
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US Patent 12131998 Integrated circuit, system and method of forming same
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US Patent 12137548 Four CPP wide memory cell with buried power grid, and method of fabricating same
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US Patent 11658049 Electromigration evaluation methodology with consideration of thermal and signal effects
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US Patent 11658114 Fusible structures and methods of manufacturing same
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US Patent 11671084 Decoupling capacitor circuits
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US Patent 11676957 Integrated circuit device, system and method
0
...
Patent Primary Examiner
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Zoila Cabrera
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Patent abstract

A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.

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