Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
November 2, 2021
Patent Application Number
20181113
Date Filed
November 13, 2018
Patent abstract
A substrate washing device includes an arm and a two-fluid jet nozzle which is supported on a leading end of the arm. The two-fluid jet nozzle may be moved towards the outer circumference of the substrate from the center of the substrate by a rotation of the arm. The substrate washing device may also include an on-arm washing liquid supply nozzle, which may supply a washing liquid to the upper surface of the substrate in a vicinity of the two-fluid jet nozzle.
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