Patent 11164758 was granted and assigned to Ebara Corporation on November, 2021 by the United States Patent and Trademark Office.
A substrate washing device includes an arm and a two-fluid jet nozzle which is supported on a leading end of the arm. The two-fluid jet nozzle may be moved towards the outer circumference of the substrate from the center of the substrate by a rotation of the arm. The substrate washing device may also include an on-arm washing liquid supply nozzle, which may supply a washing liquid to the upper surface of the substrate in a vicinity of the two-fluid jet nozzle.